In this work, oblique ballistic deposition model (BD) of thin film growth, with different deposition angles  and 65 degree, has been simulated. Since the height of these interfaces satisfied the Chapman–Kolmogorov equation, it can be characterized as a Markovian process. We have found in oblique deposition, by increasing deposition angle, Markov length decreases. In the case of vertical deposition  the calculated Kramers Moyal (KM) coefficients show that it is possible to analyze it by a Langevin equation meaning that there are two coefficients  (linear function) and  (quadratic function) and higher order of  will vanish  Calculating of KM coefficients for oblique ballistic deposition shows that it is not possible to describe the height of the interface by a Langevin equation because coefficients  is not linear function and  is not quadratic function and higher order of  does not vanish. This result is in consistent with the multiaffine structure of these oblique structures.

ballistic deposition, simulation, Markov, Langevin, probability function, fluctuation, Fokker-Planck, Kardar-Parisi-Zhang.