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JP Journal of Solids and Structures

Abstract:
CdS thin film is prepared on ITO substrate via successive ionic layer adsorption and reaction (SILAR) method using

and

as precursors. The model concerning the SILAR reaction process is discussed. Moreover, the effect of technology parameters on characteristics of film is also analyzed. The results show that the CdS thin film with uniform particle size and morphology could be obtained when the drawing rate is 8cm/min, the immersion time is 25s, the concentration of

and

is 0.1mol/l and 0.05mol/l, respectively.

Keywords and phrases: CdS, film, SILAR, morphology.

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