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Volume 23 (2024)
Volume 23, Issue 2
Pg 101 - 131 (December 2024)
Volume 23, Issue 1
Pg 1 - 100 (June 2024)
Volume 22 (2023)
Volume 22, Issue 2
Pg 85 - 140 (July-Dec 2023)
Volume 22, Issue 1
Pg 1 - 83 (June 2023)
Volume 21 (2022)
Volume 21,
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Pg 73 - 111 (December 2021)
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Pg 1 - 71 (June 2021)
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Pg 53 - 98 (December 2020)
Volume 19, Issue 1
Pg 1 - 52 (June 2020)
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Volume 18, Issue 2
Pg 55 - 89 (December 2019)
Volume 18, Issue 1
Pg 1 - 53 (June 2019)
Volume 17 (2018)
Volume 17, Issue 2
Pg 79 - 110 (August 2018)
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Pg 79 - 110 (December 2018)
Volume 17, Issue 1
Pg 1 - 77 (June 2018)
Volume 16 (2017)
Volume 16, Issue 3
Pg 53 - 98 (December 2017)
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Pg 1 - 52 (August 2017)
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Volume 15, Issue 4
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Pg 79 - 150 (October 2015)
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Pg 1 - 102 (July 2014)
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Volume 11, Issue 2
Pg 73 - 164 (April 2014)
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Pg 1 - 71 (January 2014)
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Volume 10, Issue 2
Pg 67 - 118 (October 2013)
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Pg 1 - 65 (July 2013)
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Pg 77 - 150 (April 2013)
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Pg 1 - 76 (January 2013)
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Pg 75 - 169 (October 2012)
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Pg 1 - 74 (July 2012)
Volume 7 (2012)
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Volume 6 (2011)
Volume 6, Issue 2
Pg 83 - 155 (October 2011)
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Pg 1 - 82 (July 2011)
Volume 5 (2011)
Volume 5, Issue 2
Pg 77 - 149 (April 2011)
Volume 5, Issue 1
Pg 1 - 75 (January 2011)
Volume 4 (2010)
Volume 4, Issue 2
Pg 81 - 165 (October 2010)
Volume 4, Issue 1
Pg 1 - 80 (July 2010)
Volume 3 (2010)
Volume 3, Issue 2
Pg 107 - 199 (April 2010)
Volume 3, Issue 1
Pg 1 - 106 (January 2010)
Volume 2 (2009)
Volume 2, Issue 2
Pg 109 - 218 (October 2009)
Volume 2, Issue 1
Pg 1 - 108 (July 2009)
Volume 1 (2009)
Volume 1, Issue 2
Pg 105 - 211 (April 2009)
Volume 1, Issue 1
Pg 1 - 103 (January 2009)
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Computer Science and Artificial Intelligence
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Notice:
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International Journal of Materials Engineering and Technology
International Journal of Materials Engineering and Technology
Volume 4, Issue 1, Pages 39 - 47 (July 2010)
INFLUENCE OF SUBSTRATE BIAS VOLTAGE ON OPTICAL AND STRUCTURAL CHARACTERISTICS OF ZINC OXIDE FILMS PREPARED BY RADIO FREQUENCY MAGNETRON SPUTTERING
Chaoyang Li, Takahiro Hiramatsu, Tokiyoshi Matsuda, Mamoru Furuta and Takashi Hirao
Abstract:
Zinc oxide (ZnO) thin films were prepared on quartz glass using radio frequency (RF) magnetron sputtering. Effects of substrate bias voltage on microstructure and photoluminescence (PL) characteristics of the deposited ZnO films were investigated. With the increase of substrate bias, the deposition rate decreased and the crystallinities of the ZnO films deteriorated. Both ultraviolet emission (band edge emission) and visible range emission (deep level emission) peaks were observed in the PL spectra obtained from the ZnO films annealed in oxygen ambient for 1 hour in a rapid thermal annealing system. It was found that a suitable substrate bias would contribute to the enhancement of visible range emission of the ZnO films. Thermal annealing effect on the properties of the ZnO thin films was investigated as well.
Keywords and phrases:
ZnO, radio frequency sputter, bias voltage, photoluminescence.
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P-ISSN: 0975-0444
E-ISSN: 2584-0339
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